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Technical Specification
Mode | HCLC-500 |
Vacuum chamber | 500xH600mm |
Coating | Semitransparent,gold, sliver, red blue, green,grey, black, rainbow color etc. |
Power supply | DC power supply, MF power,electrical arc, power supply, filament (power) supply , active power supply,plused bias power supply |
Vacuum chamber structure | Ertical single (side front )door (double water jacket type water cooling or sink type cooling ), pump system post position |
Vacuum system | Molecular pump +Quasi oil free vacuum system for direct coupled rotary vane pump |
Ultimate vacuum | 5.0 x 10-5Pa (Noloading clean chamber ) |
Substrate dimension | 120mm |
Heating system | Room temperature to 500C adjustable and controllable (PID control), heating by stainless steel heater pipe |
Work piece rotary | Top rotary bottom rotary +public rotation and frequency conversion step-less controllable and adjustable ,0-20 shift /min |
Thickness rate | (1.5~5.0) % |
Sputtering target | Two multi- arc, MF twin or flat target can be choiced |
Pumping time | No- loading from air to 5x 10-2 pa < 6 mins |
Work piece motion mode | 6 axix/8 axix/9 axix Public rotation/ frequency control |
Control mode | Manual/ automatic all-in one mode,touching screen + PLC |
Remarks | We can design the dimension of the vacuum chamber according to customer's demand |