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It equips with the new target and the arc power supply, arc spot is stable. It is not easy running arc, the current is low and ionparticles is small. Applied to metal, ceramics, glass and other materials of the surface coating of hard metal film and metal compounds film. Pumping speed faster, vacuum stability, and superior quality film, widely used in hardware, watches, glasses, tools, dies, metal, glass, ceramics, building materials, and other surface treatment industry.
HCVAC decorative PVD films are routinely used as a replacement for electroplated chrome. They can be applied directly over almost any substrate material and can be deposited in a wide variety of colors. The process parameters to deposit each color are stored in software recipes with different process steps. Once the coating process has started, all of the relevant process parameters are continuously monitored and controlled by the on-board computer software.
Easy to implement
To many people unfamiliar with the process, PVD coating technology seems complicated. However, with the right investments and a good support, it is easier than expected. HCVAC has developed a turnkey coating process that makes a PVD coating centre easy to implement. A complete coating process consists of several steps: Stripping (depending on the parts history); Pre-treatment; Quality control; Cleaning & drying; Fixturing & visual inspection; PVD coating; Quality control & thickness measurement and post-treatment (depending on the application). These steps are all available from one partner: HCVAC Technology, including mature technics and coatings.
Technical parameters:
Mode Dimension |
JTL-900 | JTL-1100 | JTL-1250 |
900*1000mm | 1100*1000mm | 1250*1100mm | |
Coating mode and main confirguration |
Six multi-arc targets + one set of column targets + one set of plane rectangle magnetron sputtering targets | Six multi-arc targets + a pair of twin (MF)magnetron sputtering targets |
Twelve multi-arc targets + two sets of plane rectangle magnetron sputtering targets+ a pair of twin (MF)magnetron sputtering targets |
Power source | Electric arc power, DC magnetron power, MF magnetron power, filament power, pulse power, linear ionized source. | ||
Process gas control | Quality flowmeter + electromagnetism ceramic valve | ||
Vacuum chamber structure | Vertical single(side) door, pump system postposition, double water-cooling | ||
Vacuum system | Molecule pump +Roots pump +Mechanical pump(5.0*10 -5 Pa) Diffusion pump +Roots pump +Mechanical pump(5.0*10 -4 Pa) |
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Workpiece baking temperature | Normal temperature to 350 centi-degree PID control, radiation heating. |
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Workpiece motion mode | Public rotation Frequency control: 0-20 rotation per minute | ||
Measure mode | Number display composite vacuum gauge: from atmosphere to 1.0*10 -5 Pa | ||
Control mode | Manual/Automatic/PC/PLC + HMI/PC four choice of control mode | ||
Remark | We can design the dimension of the equipment according to customers special technique requirement. |