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This machine mainly integrate the technology of arc ion evaporation, combining the ion source and the pulse bias voltage. It is full automation control when coating films. The coating will be good adhesion, scratch-proof.
The principle of vacuum electric arc ion coating is based on cold cathode, self-sustained arc discharge plasma evaporation, ionization material, combine pulsed bias technical to improve the energy and activity of deposited particles, and enhance the properties of coating. It can deposit coatings on the surface of metal as well as non-metal.
Applied industries: It is widely used in the watchband, watchcase, jewelry, mobile shell, hardware, tableware, etc. It can coat TiN, TiC, TiCN, TiAlN, CrN, Cu, Au, Al2O3 and other decorative films. It can get fineness and smooth film, good adhesion. Samplescoating effect !
The coating experts of your own company: Full set solution for the coating production.
HCVAC can help you to enter the PVD coating easily by our vacuum coating machine and full range service. We will provide with most suitable technology according to your requirements.
We will make the special coating solution for each customer; Combine the full set production technicto meet your requirements, to ensure high efficiency of production.
Easy to implement
To many people unfamiliar with the process, PVD coating technology seems complicated. However, with the right investments and a good support, it is easier than expected. HCVAC has developed a turnkey coating process that makes a PVD coating centre easy to implement. A complete coating process consists of several steps: Stripping (depending on the parts history); Pre-treatment; Quality control; Cleaning & drying; Fixturing & visual inspection; PVD coating; Quality control & thickness measurement and post-treatment (depending on the application). These steps are all available from one partner: HCVAC Technology, including mature technics and coatings.
We developed a complete after-sales system and effective service measures. Company now owns a professional after-sales service team with more than ten experienced engineers.
ISO 9001 standard to ensure the quality can meet the customers requirements.
Please feel free to contact us for further information!
Technical Parameter:
Mode | JTL-900 | JTL-1100 | JTL-1250 |
900*1000mm | 1100*1000mm | 1250*1100mm | |
| Six multi-arc targets + one set of column targets + one set of plane rectangle magnetron sputtering targets | | Twelve multi-arc targets + two sets of plane rectangle magnetron sputtering targets+ a pair of twin (MF)magnetron sputtering targets |
Power source | Electric arc power, DC magnetron power, MF magnetron power, filament power, pulse power, linear ionized source. | ||
Process gas control | Quality flowmeter + electromagnetism ceramic valve | ||
Vacuum chamber structure | Vertical single(side) door, pump system postposition, double water-cooling | ||
Vacuum system | Molecule pump +Roots pump +Mechanical pump(5.0*10 -5 Pa) | ||
Workpiece baking temperature | | ||
Workpiece motion mode | Public rotation Frequency control: 0-20 rotation per minute | ||
Measure mode | Number display composite vacuum gauge: from atmosphere to 1.0*10 -5 Pa | ||
Control mode | Manual/Automatic/PC/PLC + HMI/PC four choice of control mode | ||
Remark | We can design the dimension of the equipment according to customers special technique requirement. |
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