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Technical Parameter:
Mode |
JTL-900 |
JTL-1100 |
JTL-1250 |
900 x 1000mm |
1100 x 1000mm |
1250 x 1100mm |
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Six multi-arc targets + one set of column targets + one set of plane rectangle magnetron sputtering targets |
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Twelve multi-arc targets + two sets of plane rectangle magnetron sputtering targets+ a pair of twin (MF)magnetron sputtering targets |
Power source |
Electric arc power, DC magnetron power, MF magnetron power, filament power, pulse power, linear ionized source. |
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Process gas control |
Quality flowmeter + electromagnetism ceramic valve |
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Vacuum chamber structure |
Vertical single(side) door, pump system postposition, double water-cooling |
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Vacuum system |
Molecule pump +Roots pump +Mechanical pump(5.0*10 -5 Pa) |
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Workpiece baking temperature |
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Workpiece motion mode |
Public rotation Frequency control: 0-20 rotation per minute |
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Measure mode |
Number display composite vacuum gauge: from atmosphere to 1.0*10 -5 Pa |
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Control mode |
Manual/Automatic/PC/PLC + HMI/PC four choice of control mode |
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Remark |
We can design the dimension of the equipment according to customers special technique requirement. |