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Technical Parameter:
Mode | JTL-900 | JTL-1100 | JTL-1250 |
900 x 1000mm | 1100 x 1000mm | 1250 x 1100mm | |
| Six multi-arc targets + one set of column targets + one set of plane rectangle magnetron sputtering targets | | Twelve multi-arc targets + two sets of plane rectangle magnetron sputtering targets+ a pair of twin (MF)magnetron sputtering targets |
Power source | Electric arc power, DC magnetron power, MF magnetron power, filament power, pulse power, linear ionized source. | ||
Process gas control | Quality flowmeter + electromagnetism ceramic valve | ||
Vacuum chamber structure | Vertical single(side) door, pump system postposition, double water-cooling | ||
Vacuum system | Molecule pump +Roots pump +Mechanical pump(5.0*10 -5 Pa) | ||
Workpiece baking temperature | | ||
Workpiece motion mode | Public rotation Frequency control: 0-20 rotation per minute | ||
Measure mode | Number display composite vacuum gauge: from atmosphere to 1.0*10 -5 Pa | ||
Control mode | Manual/Automatic/PC/PLC + HMI/PC four choice of control mode | ||
Remark | We can design the dimension of the equipment according to customers special technique requirement. |