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Applied industries: It is widely used in the watchband, watchcase, jewelry, mobile shell, hardware, tableware, etc. It can coat TiN, TiC, TiCN, TiAlN, CrN, Cu, Au, Al2O3 and other decorative films. It can get fineness and smooth film, good adhesion. Samplescoating effect!
Benefits of PVD
Increase life span of the PVD coated products
Corrosion resistance
Chemical resistance
Wear resistance
Friction resistance
Superior Decorative finish
Uniform coating
Low maintenance cost
Environment friendly
Will not tarnish / fade
Re coating possible at a high quality level
The coating experts of your own company: Full set solution for the coating production.
HCVAC can help you to enter the PVD coating easily by our vacuum coating machine and full range service. We will provide with most suitable technology according to your requirements.
We will make the special coating solution for each customer; Combine the full set production technicto meet your requirements, to ensure high efficiency of production.
Easy to implement
To many people unfamiliar with the process, PVD coating technology seems complicated. However, with the right investments and a good support, it is easier than expected. HCVAC has developed a turnkey coating process that makes a PVD coating centre easy to implement. A complete coating process consists of several steps: Stripping (depending on the parts history); Pre-treatment; Quality control; Cleaning & drying; Fixturing & visual inspection; PVD coating; Quality control & thickness measurement and post-treatment (depending on the application). These steps are all available from one partner: HCVAC Technology, including mature technics and coatings.
Technical Parameter:
Mode Dimension | JTL-900 | JTL-1100 | JTL-1250 |
900*1000mm | 1100*1000mm | 1250*1100mm | |
Coating mode and main confirguration | Six multi-arc targets + one set of column targets + one set of plane rectangle magnetron sputtering targets | Six multi-arc targets + a pair of twin (MF)magnetron sputtering targets | Twelve multi-arc targets + two sets of plane rectangle magnetron sputtering targets+ a pair of twin (MF)magnetron sputtering targets |
Power source | Electric arc power, DC magnetron power, MF magnetron power, filament power, pulse power, linear ionized source. | ||
Process gas control | Quality flowmeter + electromagnetism ceramic valve | ||
Vacuum chamber structure | Vertical single(side) door, pump system postposition, double water-cooling | ||
Vacuum system | Molecule pump +Roots pump +Mechanical pump(5.0*10 -5 Pa) Diffusion pump +Roots pump +Mechanical pump(5.0*10 -4 Pa) | ||
Workpiece baking temperature | Normal temperature to 350 centi-degree PID control, radiation heating. | ||
Workpiece motion mode | Public rotation Frequency control: 0-20 rotation per minute | ||
Measure mode | Number display composite vacuum gauge: from atmosphere to 1.0*10 -5 Pa | ||
Control mode | Manual/Automatic/PC/PLC + HMI/PC four choice of control mode | ||
Remark | We can design the dimension of the equipment according to customers special technique requirement. |