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gradually play a leading role technique of supttering coating field. The reason why this machine advantage with DC sputtering coating characteristic
1) surmount anode disppear phenomenon
2) Recede or eliminate abnormal arc light discharge of target
Therefore, its had advanced performance stability of sputtering processing and deposit rate of dielectric film.
We had developed plane target, columnar target, twin targets ect. MF sputtering target struture and layout
It is widely used in thewatchband, watchcase, mobile shell, hardware tableware, etc. Lt can coat TiN, TiC, TiCN, TiAIN, TrN, Cu, Au. And other decorative films.